azonenberg | nmz787: isotropic etches for silicon? | 04:04 |
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azonenberg | your options are, basically | 04:04 |
azonenberg | HF + strong oxidizer | 04:04 |
azonenberg | or SF6 plasma | 04:04 |
nmz787 | azonenberg: someone on mems-list said DRIE without side-wall passivation, same thing as SF6 plasma? | 07:39 |
azonenberg | nmz787: DRIE is normally alternating steps of SF6 plasma and some kind of fluorine-based passivation | 07:40 |
azonenberg | i forget what the base is but it ends up being essentially PECVD teflon | 07:41 |
nmz787 | what's easiest? | 08:08 |
nmz787 | is DRIE cheap? | 08:08 |
nmz787 | i wouldn't need much, i think, 1 micron deep to start | 08:09 |
nmz787 | this local lab would let me use their lab for $20/hr, spin coater, fume hood, solvent cabinet and address for delivery, already have HF | 08:10 |
nmz787 | they also have a FIB, but that's another pricing scheme that is a bit blurry | 08:10 |
nmz787 | (not sure if any of their chems are still 'good') or if they go bad | 08:10 |
Sync__ | doing DRIE at home is not the cheapest thing to do | 09:05 |
lkcl_ | kanzure: :) | 10:11 |
nmz787 | no i wouldn't do either at home | 10:22 |
kanzure | lkcl_: sup | 15:30 |
--- Fri Sep 27 2013 | 00:00 |
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