B0101 | hmmm interesting, in a simulation, Al ions @ 30 KeV displace quite a number of Silicon atoms from the target, but none of the Al ions actually replace the displaced Si atoms... | 02:05 |
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B0101 | so, I assume we need to get to the MeV range to get actual implantation? | 02:11 |
glowplug | Megavolts? | 02:11 |
B0101 | yup | 02:12 |
azonenberg | Hundreds of keV might be enough | 02:13 |
azonenberg | In any case, diffusion is much easier to do at home | 02:13 |
glowplug | We don't need that technology for ~405nm and larger devices though correct? | 02:13 |
azonenberg | just coat the ion source onto the surface of the wafer and heat up to 1000C or so | 02:14 |
azonenberg | glowplug: 405 is rather optimistic | 02:14 |
azonenberg | i'd shoot for a micron | 02:14 |
azonenberg | with 5 and 10 as stepping stones | 02:14 |
azonenberg | And no, you dont need implantation for large devices | 02:14 |
azonenberg | diffusion is fine | 02:14 |
glowplug | I have solved quite a few problems today. | 02:14 |
glowplug | One major problem is with the glass linear encoders I am curious if you have some insight. | 02:16 |
glowplug | I can get 5 micron accuracy for $200 per axis. | 02:17 |
glowplug | Its gets unrealistically expensive after that. | 02:17 |
glowplug | If I can get 1 micron cuts in a glass strip I can handle the optics / electronics. So what I'm trying to do is get the strip outsourced and DIY everything else. | 02:19 |
glowplug | The reason for the linear encoder is real-time antibacklash compensation. Without it the repeat accuracy of the machine wont be ~1 micron it would probably be far worse. | 02:20 |
glowplug | Also by $200 per axis I mean $200 per linear encoder not counting any other parts. That price really need to drop to keep the machine cost reasonable. | 02:27 |
glowplug | http://bit.ly/Yh11Ud | 02:45 |
glowplug | Oh right I was supposed to remind you about the wiki page. Haha | 02:54 |
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