| --- Wed Feb 20 2013 | 00:00 | |
| B0101 | azonenberg: when you do etching, does organic contaminants seriously affect the etch process? | 15:28 |
|---|---|---|
| azonenberg | Depends on what you're etching | 15:29 |
| azonenberg | and what levels of contamination | 15:29 |
| azonenberg | an RCA clean beforehand never hurts unless you have metal interconnect | 15:29 |
| Sync_ | yeah | 15:49 |
| Sync_ | murphy struck again btw | 15:50 |
| Sync_ | vented chamber to fix issue, baked chamber, degassed sources, noticed that si is almost empty | 15:54 |
| Sync_ | m( | 15:54 |
| azonenberg | Si empty? | 15:56 |
| azonenberg | as in SiH4? | 15:56 |
| Sync_ | no, the si evaporator | 15:57 |
| Sync_ | the chamber has two electron beam evaps, one with Ge and one with Si and well .. after 5 years si ran out | 15:58 |
| Sync_ | I might be able to melt the stuff on the walls of the crucible in the middle but uhhh | 16:00 |
| Sync_ | the chamber pressure is not going to be happy | 16:00 |
| azonenberg | lol | 16:18 |
| azonenberg | oh, i thought you loaded the crucible separately for each sample | 16:18 |
| Sync_ | no | 16:18 |
| --- Thu Feb 21 2013 | 00:00 | |
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