#homecmos IRC log for Monday, 2013-02-04

--- Mon Feb 4 201300:00
nmz787azonenberg: http://ma.ecsdl.org/content/MA2012-02/59/3990.full.pdf10:30
nmz787azonenberg: Low cost UV laser direct write photolithography10:30
nmz787system for rapid prototyping of microsystems10:30
azonenbergNice10:30
Sync_that's neat10:32
azonenbergI want to build one10:32
Sync_just lugged my mill in the cellar10:32
azonenbergsomething like that has been on my TODO for a while10:32
azonenbergjust been too busy10:32
Sync_I hopy my back does not kill me tomorrow10:32
azonenbergi think if/when i build one i'll add machine vision software to the camera10:32
azonenbergso it can automatically align the new pattern to existing alignment marks10:33
Sync_should be easy enough to do with opencv10:33
azonenbergYeah10:35
azonenbergBecause if i could solve the litho problem10:35
azonenbergand get a vacuum chamber for metal deposition10:35
azonenbergthen MEMS are well within reach10:35
azonenbergCMOS will be a lot harder due to contamination concerns10:35
azonenbergbut a little K- ions won't hurt a comb drive :p10:35
Sync_aaah ok, my back is already killing me10:39
berndjazonenberg, is contamination an issue regardless of feature size, or does it become less critical if you ran a 100┬Ám process?19:46
Sync_contamination is not an issue of feature size19:50
Sync_particle contamination is19:50
Sync_but metal ions always get you19:51
azonenbergberndj: Metal ion contamination will kill transistors no matter how big they are23:49
azonenbergBut particles less than, say, half your feature size23:49
azonenbergaren't that big a deal23:50
berndjbut i assume it's at least a matter of ion concentration, and not absolute number?23:50
azonenbergI believe so, yes23:50
berndji see. so reagent purity is directly the relevant factor?23:51
azonenbergYes23:51
azonenbergAs well as cleanliness of glassware etc23:51
azonenbergBut for MEMS you dont care about electrical performance nearly as much23:52
azonenbergsince the Si is just a mechanical substrate23:52
berndjuse giant glassware to take advantage of scaling factors :)23:52
azonenbergWhich is why i think they're a better starter project23:52
berndjwhy do you suppose MEMS came only much later in the history of the tech?23:53
azonenbergThat i'm not sure23:53
berndjmy first instinct would be to assume that it's in some sense "harder" than ICs (i'm assuming you're using "CMOS" loosely here, and that NMOS would have the same sensitivity)23:54
berndjmaybe it just didn't seem that interesting earlier than it became mainstream?23:55
azonenbergYes, although i hear BJTs are slightly less sensitive23:56
azonenbergi dont understand the physics to that extent23:56
berndji don't recall jeri ellsworth using crazy-level purity reagents?23:57
berndji think she used conductive epoxy to make contacts and even gates. very ghetto-style!23:58
azonenbergYes, and thats why i filed this under the "to learn" level23:59
azonenbergFrom what i understand metal contamination at room temp isnt as big a deal23:59
azonenbergthe big concern is keeping things clean before you do diffusion23:59
--- Tue Feb 5 201300:00

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