#homecmos IRC log for Friday, 2011-07-15

azonenbergSo I'm making progress toward identifying the source of my contaminant00:01
azonenbergGoing to do several more careful experiments tonight, trying even harder to minimize particulates00:02
azonenbergAnd, more importantly, imaging samples after each step00:02
azonenbergto determine where the contaminant comes from00:02
azonenbergI'll start with an acetone rinse followed by an RCA clean00:02
azonenbergAll glassware was triple rinsed in water followed by one acetone rinse, i'll do one last rinse to remove any dust that might be inside before starting work00:23
azonenbergSpin coat Tantalumfilm on bare silicon00:23
azonenbergAnother die, spin coat photoresist, then tantalumfilm (but don't develop the PR)00:24
azonenbergNext one, resist + develop + tantalumfilm00:24
azonenbergAnd see which step causes it to start getting bumpy00:24
azonenbergThen, when my latest parts order comes in, I'll run the offending solution through an 0.2um filter and see if the problem goes away00:25
azonenbergO_o00:48
azonenbergI forgot that my test dies all this time were surplus wafers :P00:49
azonenbergUpon closer inspection they show visible particulate contamination00:49
azonenbergWe'll see if an RCA clean takes it off, if not i'll start using my new wafers lol00:49
CIA-67homecmos r97 | trunk/lithography-tests/labnotes/azonenberg_labnotes.txt | Updated lab notes for last week's experiments00:56
CIA-67homecmos r98 | trunk/lithography-tests/default/ (65 files in 65 dirs) | Pushing old edits to lithography-tests default library (obsolete)01:18
azonenbergIn other news, glade 4.0.57 fixed the OpenGL bug on Debian-based distros that was annoying me so much01:32
azonenbergbefore, i had to fall back to non-accelerated rendering (and the accompanying horrible performance) because when i used GL half of the dialog boxes turned blank01:32
azonenbergnext step, design a test mask suitable for my current process01:34
azonenbergAnd hope i can actually get somewhere :)01:34
azonenberg_labContaminant positively identified02:39
azonenberg_labfor better or for worse02:39
azonenberg_labSilicon particles02:39
azonenberg_labso the next question is, how to remove them02:40
azonenberg_labAnd it looks like i have my answer03:04
azonenberg_labSwab with 70% IPA followed by RCA clean03:04
azonenberg_labwolfspraul: Getting better results finally, i'm halfway through an experiment that if successful will give me 20um features in <100> Si04:18
azonenberg_labMy mystery contaminant is almost 100% identified as silicon particles from dicing04:18
wolfspraulhe :-)04:21
azonenberg_labI was wondering why spectroscopy didnt show anything but hardmask and silicon04:21
wolfspraulgood news is so powerful, keep it coming and good luck!04:21
azonenberg_labTurns out, thats all i had :P04:21
azonenberg_labBut said silicon wasnt entirely flat04:22
azonenberg_labi need to explore ways of removing it, sonication is a possibility04:22
azonenberg_labright now i'm just rubbing with a swab, it got off most but there are still a few little bits04:22
azonenberg_labBut in any case, this experiment i'm about to run should give me feedback as to whether i reduced particle counts successfully or not04:24
azonenberg_labEven if it doesnt work entirely04:24
azonenberg_labFirst die was overdeveloped, second one didnt resolve the entire pattern but is good for a first try04:45
azonenberg_labNo visible cracking in the important parts04:45
azonenberg_labgoing to pop it in the oven in a few mins to bake for an hour, then KOH etch04:45
CIA-67homecmos r99 | trunk/lithography-tests/labnotes/azonenberg_labnotes.txt | Tonight's lab notes (still in progress)04:50
CIA-67homecmos r100 | trunk/lithography-tests/labnotes/azonenberg_labnotes.txt | Merging earlier changes to lab notes04:57
CIA-67homecmos r101 | trunk/lithography-tests/labnotes/azonenberg_labnotes.txt | Today's lab notes06:23
--- Sat Jul 16 201100:00

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